Products & Services


Sputtering technique

Sputtering is a technique for forming high-quality thin films

Sputtering is a kind of dry plating. A target of the thin-film forming (deposition) material and a substrate as an anode are placed in a vacuum chamber filled with inert gas (Ar gas etc.). A high voltage is applied between them.
The high voltage generates plasma and in the plasma, Ar+ collides with the target at high speed. The target particles which have been sputtered, adhere to the substrate, leading to film formation.

High-precision thin film formation technology diagram

• The attachment energy of the deposition material is so high that it can form a film with high adhesion strength.
• Precision film thickness control is possible, resulting in a thin film with excellent density and uniformity.
• Sputtering can form a metal film with a high melting point, which is difficult by vapor deposition, and also can form a film without changing the composition of the alloy.
• Single-element metals, alloy materials, oxides, nitrides, etc. can be formed on the surface of films, resin molded products, metals, glasses, etc. with a nanoorder thickness.

Difference between Sputtering and Vapor deposition

 Deposition method
SputteringBy hitting argon ions against thin-film forming (deposition) metal, metal oxide, etc., the fine particles which have been sputtered adhere to the substrate and deposit on the surface.
Vapor deposition 
 Film adhesionThin film densityAlloy depositionDeposition on heat-sensitive substratesDeposition rate
Vapor deposition

Deposition Materials and Functions

MetalSUSCorrosion resistance, antibacterial, decorative, antistatic
Cu, Cu alloyConductive, electromagnetic shielding, antibacterial
TiHeat retention and shielding
Ag alloyRay reflection film, electromagnetic wave shield
CrCorrosion resistance
Metal OxideSiO2Gas barrier film, insulating film
ITOTransparent conductivity
TiO2Photocatalyst, hydrophilic
CarbonGraphiteHighly thermally conductive, conductive
DLCSliding properties, high hardness, gas adsorption
Laminated filmsHigh-refractive index material/Ag alloy/High-refractive index materialHeat ray reflection, thermal insulation
Low-refractive index material/High-refractive index material/Low refractive index material etc.Anti-reflective film
SiO2/ITOTransparent electrode

Substrate Materials

Substrate Materials
OtherGlass, ceramics

Prototyping and Mass production of Functional Films

• A wide range of base material widths up to 1600 mm are available.
• Our plant is equipped for prototyping, small lots and mass production, capable of deposition length up to 2500 m (t:125 μm).

About Functional Films

Prototype Deposition on 3D molded products, Glass, etc., and Mass Production


• Base materials up to 1 m × 2 m are available.
• Please contact us for special cases, such as film formation on non-flat surfaces, side faces of base materials, curved surfaces and protruding objects.